Cross beam lithography at TASC

Technique for preparation of precise wafer cross sections and applications to electron beam lithography of poly„methylmethacrylate... resist

We have developed a method of cross-sectioning silicon wafers with high placement precision. It is implemented by using optical lithography and deep plasma high aspect ratio etching of a thin line, which is used as the breaking axis. This technique is then applied to cross-sectional scanning electron microscopy ~SEM! studies of sub-50 nm electron beam lithography in ~poly!methylmethacrylate res...

Computer Simulation of Processes at Electron and Ion Beam Lithography, Part 2: Simulation of Resist Developed Images at Electron and Ion Beam Lithography

Computer Simulation of Electron and Ion Beam Lithography of Nanostructures

In this paper a review of the authors results on mathematical modeling of the processes at electron or ion beam lithography of nanostructures is presented. Our Monte Carlo simulation tools for electron and ion exposures are successfully applied for the energy deposition calculation at electron or ion lithography of resist layers. At ion lithography electronic energy losses of penetrating electr...

Computer Simulation from Electron Beam Lithography to Optical Lithography

Simulation of electron beam lithography and optical lithography has been combined to investigate the influence of a distorted photomask feature on final photoresist image. Unlike the previous optical lithography simulation which was based on ideal mask design, the combined simulation has shown that mask distortion due to electron proximity effect play an important role in worsening the optical ...

Effects of beam pointing instability on two-beam interferometric lithography

In a photolithographic system, the mask patterns are imaged through a set of lenses on a resist-coated wafer. The image of mask patterns physically can be viewed as the interference of the plane waves of the diffraction spectrum captured by the lens set incident on the wafer plane at a spectrum of angles. Two-beam interference fringe is the simplest format of the image. Consequently, two-beam i...